High-purity gas purification equipment | Industrial Gas Business

Impurity concentration: less than 1 ppb

Introduce Ultrahigh-Purity Gas Easily

Equipment for stably supplying ultrahigh-purity gases required for
industry

Various high-purity inert gases (argon, nitrogen, etc.) and hydrogen (H2), which play an important role as zero gas for
microanalyzers, explosion-proof shielding gas for welding or as the foundation for ultra-precision processing technology, can be
refined to ultrahigh purity by removing impurity components using easy-to-introduce in-line equipment.

Concerns about introduction of ultrahigh-purity gas equipment

We want to use ultrahigh-purity gas but
are concerned about the cost.
We have no space for gas purification equipment.
We want to use only a small amount of ultrahigh-purity gas.
We do not have enough flow with an inline system and are concerned about the cost.
We are also concerned about running costs and maintainability.

All problems solved by Osaka Gas Liquid's high-purity gas purification equipment

Features of high-purity gas purification equipment

Refining ultrahigh-purity gas

Impurity concentration:
less than 1 ppb
99.999 vol% minimum

It refines gas to ultrahigh purity through a combination of multiple catalysts and adsorbents.
Helping improve economy and reduce costs

The adsorbents are renewable, requiring no replacement.

The simplified structure has reduced production costs.

No utilities are required.

The renewable adsorbents for impurities and the simplified structure help reduce both initial and running costs.
Compact, space-saving inline system

It can be used simply by attaching it to the existing gas facilities. Further compactness is achieved through the use of newly developed catalysts.
Compatible with two types of gases: inert gases and hydrogen

A lineup from 3 liters to 300 liters per minute is available for purification of various gases, including inert gas and hydrogen.

Main applications

Carrier gas/
zero gas for
microanalyzers
Shield gas for welding
Atmospheric gas
Purge gas
For a variety of semiconductor manufacturing equipment, CVD equipment, etc.
(For equipment requiring high purity)

Product lineup

Low-cost type [Fine Purer]

Fine Purer

A continuous supply type that does not require renewal work is also available.

・ By automatically switching between the two purification cylinders, continuous purification is possible.
　
・ Custom-made according to customer needs

Specifications

Model

Fine Purer

Gas type

For inert gas, hydrogen and air

Flow rate

3～300NL/min

Utilities

Not required

Guaranteed purification values

For inert gas
Impurity	O2	CO	CO2	H2O
Refined gas	＜1	＜1	＜1	＜1 (D.P.-110℃)
Analyzer	API-MS	GC	API-MS	API-MS or dew point meter

For hydrogen
Impurity	O2	CO	CO2	H2O
Refined gas	＜1	＜1	＜1	＜1 (D.P.-110℃)
Analyzer	API-MS	GC	API-MS	API-MS or dew point meter

(unit: ppb)

New product

[Fine Purer Getter Type]
FPI-1GTR

[Fine Purer Getter Type] FPI-1GTR

[Features]

(1) Removing impurities to the utmost limit

Applicable gases	Noble gases: He, Ne, Ar, Kr and Xe
Impurity concentration in feedstock gas	Total 10 ppm (5N) max.
Impurity concentration in refined gas	Total 10 ppb (8N) max.
Impurities to be removed	H2 ,N2 , CH4 , O2 , CO , CO2 , H2O

(2) Power supply box integrated

A simplified structure equipped with a power supply box as standard

(3) With safety function

It has the function of automatically preventing the heater from overheating.

(4) RoHS-compliant

(5) Delivery possible in one week*

* Please consult us when ordering multiple units.

Specifications

Model	FPI-1GTR
Maximum pressure	1.0MPaG
Working pressure	0.5MPaG
Maximum flow rate	1.0L/min
Dimensions	Φ 114mm × H 472mm
Weight	7.8㎏
Power supply	100VAC
Power consumption	55W
Connection diameter	1/16 inch Swagelok (female)